Specialty Materials Division - Sputtering Targets

Sputtering Targets

Sputtering targets are used to produce thin films of metals or compounds. A source material is bombarded with plasma ions that dislodge atoms from the surface of the target. The ejected atoms then deposit atop a substrate to form a film coating that is several atomic layers thick.

The flat panel display industry, as well as all other coating industries, requires a material which is conductive and transparent. Indium, when sputtered or evaporated, exhibits such properties and is an excellent material for meeting those requirements. AIM can provide Indium and Indium/Tin products in both a sputtering target form or as an evaporation source.

Another requirement of the targeting industry is the ability to bond a target material to a backing plate prior to the sputtering process. Indium’s unique properties lend itself to be an excellent bonding glue for this application. AIM offers pure Indium in bar form for your convenience.